DSNF 303
FLAT PATTERN DESIGN
- Catalog entry
Flat Pattern Design
One hour lecture, four hours laboratory (3).
Prerequisites: DSNF 254 (Grade of “C” or better).
Introduction to principles of flat pattern making. Designing and styling of original ideas from the two-dimensional to the three-dimensional form.
- Detailed Description of Content of Course
The student will explore the principles, methods and techniques of garment design and pattern manipulation by the flat pattern process. Topics include: dart manipulation; added fullness to garments; contouring; sleeves; skirts and pants; garment details; and the design process.
- Detailed Description of Conduct of Course
Lecture/demonstration will provide an overview of flat pattern methods and techniques. The studio environment provides hands-on experience in pattern manipulation and product development the flat pattern method.
- Goals and Objectives
Upon successful completion of this course, the student will demonstrate:
- Understanding of the principles, methods and techniques of flat pattern design.
- Understanding of the interrelationship of fabrics, style lines and pattern development.
- Understanding of the relationship between garment design and the human form.
- Skill in creating a proportionate and aesthetically appealing design.
- Application of flat pattern techniques in the development of original designs.
- Application of the design process.
- Critical thinking from the two-dimensional to the three-dimensional form.
- Assessment Measures
Assessment in lecture will be based on tests. In studio, assessment will be based on projects using flat pattern techniques.
- Other Course Information
- Approval and Subsequent Reviews
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