Text only version INDEX::Visual & Performing Arts :: DSNF

 

 
Fashion Design

DSNF 303
FLAT PATTERN DESIGN

  1. Catalog entry

Flat Pattern Design
One hour lecture, four hours laboratory (3).

Prerequisites: DSNF 254 (Grade of “C” or better).

Introduction to principles of flat pattern making. Designing and styling of original ideas from the two-dimensional to the three-dimensional form.

  1. Detailed Description of Content of Course

The student will explore the principles, methods and techniques of garment design and pattern manipulation by the flat pattern process. Topics include: dart manipulation; added fullness to garments; contouring; sleeves; skirts and pants; garment details; and the design process.

  1. Detailed Description of Conduct of Course

Lecture/demonstration will provide an overview of flat pattern methods and techniques. The studio environment provides hands-on experience in pattern manipulation and product development the flat pattern method.

  1. Goals and Objectives

Upon successful completion of this course, the student will demonstrate:

  • Understanding of the principles, methods and techniques of flat pattern design.
  • Understanding of the interrelationship of fabrics, style lines and pattern development.
  • Understanding of the relationship between garment design and the human form.
  • Skill in creating a proportionate and aesthetically appealing design.
  • Application of flat pattern techniques in the development of original designs.
  • Application of the design process.
  • Critical thinking from the two-dimensional to the three-dimensional form.
  1. Assessment Measures

Assessment in lecture will be based on tests. In studio, assessment will be based on projects using flat pattern techniques.

  1. Other Course Information
  2. Approval and Subsequent Reviews